Indexing Metadata

1 Title of the Article Band Gap Engineering of Wurtzite Silicon by Uniaxial Pressure
2 Author's name Ziwei Cui: Space Star Technology CO., LTD., Beijing, China, (e-mail: zwcui129@gmail.com
3 Author's name
4 Subject Information Technology
5 Keyword(s) Electronic properties, Wurtzite silicon (WZ-Si), Uniaxial pressure
6 Abstract

Electronic properties of wurtzite silicon (WZ-Si) are investigated by first-principle calculation. It is found that WZ-Si is an indirect band-gap semiconductor at ambient condition. A uniaxial strain along the c-direction can reduce the direct energy gap at Γ significantly. Calculated pressure needed to compress WZ-Si is not too high, which shows strained WZ-Si would be potential in practical use. The effective mass of electron is found strongly dependent on strain which could be used to tailor the transport properties.

7 Publisher Innovative Research Publication
8 Journal Name; vol., no. International Journal of Innovative Research in Computer Science & Technology (IJIRCST); Volume-5 Issue-2
9 Publication Date March 2017
10 Type Peer-reviewed Article
11 Format PDF
12 Uniform Resource Identifier https://ijircst.org/view_abstract.php?title=Band-Gap-Engineering-of-Wurtzite-Silicon-by-Uniaxial-Pressure&year=2017&vol=5&primary=QVJULTI5MA==
13 Digital Object Identifier(DOI) 10.21276/ijircst.2017.5.2.3   https://doi.org/10.21276/ijircst.2017.5.2.3
14 Language English
15 Page No 230-233